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Lam Research 003-102303-02-06 Gas Path Control Component
Lam Research 003-102303-02-06
Product Overview
003-102303-02-06 is a critical Gas Panel subsystem component designed by Lam Research for its advanced plasma processing systems. Specifically, it is defined as a Pneumatic Process Isolation Valve or Pneumatic Actuator Assembly. In Lam Research’s spare part system, the “003” prefix typically identifies pneumatic, fluid, or mechanical actuation hardware.
As a core component of the tool’s Gas Box air management system, 003-102303-02-06 functions as a precise “gas access controller”. Upon receiving commands from the process control system (e.g., PMC), its pneumatic actuator enables fast and accurate opening or closing of designated gas lines, controlling the delivery and cutoff of multiple process gases including Ar, CF₄, CHF₃, O₂, Cl₂, and BCl₃.
This component directly determines whether process gases enter the reaction chamber on time and accurately according to process sequencing. Any valve delay, leakage, or stiction may cause process abnormalities, wafer scrap, or equipment alarm and shutdown. As an original-equipment-manufacturer-certified high-reliability pneumatic valve, 003-102303-02-06 features ultra-fast response, excellent corrosion resistance, extended service life, and precise particle control that meet stringent semiconductor industry standards. It is essential for securing etch and deposition gas accuracy, improving Overall Equipment Effectiveness (OEE), and stabilizing production yield.
003-102303-02-06 is a critical Gas Panel subsystem component designed by Lam Research for its advanced plasma processing systems. Specifically, it is defined as a Pneumatic Process Isolation Valve or Pneumatic Actuator Assembly. In Lam Research’s spare part system, the “003” prefix typically identifies pneumatic, fluid, or mechanical actuation hardware.
As a core component of the tool’s Gas Box air management system, 003-102303-02-06 functions as a precise “gas access controller”. Upon receiving commands from the process control system (e.g., PMC), its pneumatic actuator enables fast and accurate opening or closing of designated gas lines, controlling the delivery and cutoff of multiple process gases including Ar, CF₄, CHF₃, O₂, Cl₂, and BCl₃.
This component directly determines whether process gases enter the reaction chamber on time and accurately according to process sequencing. Any valve delay, leakage, or stiction may cause process abnormalities, wafer scrap, or equipment alarm and shutdown. As an original-equipment-manufacturer-certified high-reliability pneumatic valve, 003-102303-02-06 features ultra-fast response, excellent corrosion resistance, extended service life, and precise particle control that meet stringent semiconductor industry standards. It is essential for securing etch and deposition gas accuracy, improving Overall Equipment Effectiveness (OEE), and stabilizing production yield.
Product Specifications
Parameter Name
Parameter Value
Product Model
003-102303-02-06
Manufacturer
Lam Research
Product Type
Pneumatic Process Isolation Valve / Pneumatic Actuator Assembly
Applicable Systems
Lam Research 2300 Series and Versys Series Etch/Deposition Tools
Valve Body Material
316L Stainless Steel (Electropolished)
Internal Seal Material
FFKM (Perfluoroelastomer) or Metal Seal (configuration-dependent)
Port Type
1/4-inch VCR or Swagelok Face Seal Fitting
Actuation Method
Double-acting or Single-acting Pneumatic Actuator (Spring-return)
Supply Air Pressure
Typical 80 - 100 psi (5.5 - 6.9 bar) Clean Dry Air (CDA)
Response Time
< 100 ms (typical)
Maximum Working Pressure
150 psi (10.3 bar)
Maximum Working Temperature
100°C (seal-material-dependent)
Leak Rate
< 1.0 × 10⁻⁹ mbar·L/s (seat seal, helium leak test)
Electrical Interface
Integrated Solenoid Valve (24 VDC) with Position Sensor (Open/Close Feedback)
Mounting Method
Fixed to Gas Panel via mounting holes on valve body
| Parameter Name | Parameter Value |
|---|---|
| Product Model | 003-102303-02-06 |
| Manufacturer | Lam Research |
| Product Type | Pneumatic Process Isolation Valve / Pneumatic Actuator Assembly |
| Applicable Systems | Lam Research 2300 Series and Versys Series Etch/Deposition Tools |
| Valve Body Material | 316L Stainless Steel (Electropolished) |
| Internal Seal Material | FFKM (Perfluoroelastomer) or Metal Seal (configuration-dependent) |
| Port Type | 1/4-inch VCR or Swagelok Face Seal Fitting |
| Actuation Method | Double-acting or Single-acting Pneumatic Actuator (Spring-return) |
| Supply Air Pressure | Typical 80 - 100 psi (5.5 - 6.9 bar) Clean Dry Air (CDA) |
| Response Time | < 100 ms (typical) |
| Maximum Working Pressure | 150 psi (10.3 bar) |
| Maximum Working Temperature | 100°C (seal-material-dependent) |
| Leak Rate | < 1.0 × 10⁻⁹ mbar·L/s (seat seal, helium leak test) |
| Electrical Interface | Integrated Solenoid Valve (24 VDC) with Position Sensor (Open/Close Feedback) |
| Mounting Method | Fixed to Gas Panel via mounting holes on valve body |
Structure and Composition
003-102303-02-06 is a high-precision integrated component that combines a pneumatic actuator and a high-purity shut-off valve body, embodying Lam Research’s professional expertise in ultra-clean gas control technology. The assembly consists of two core functional modules: a pneumatic actuator module and a valve body & seal module.
The pneumatic actuator module adopts a compact cylinder structure, equipped with a piston-spring configuration for single-acting versions or dual-piston design for double-acting versions. A high-response solenoid pilot valve is integrated on the top or side of the actuator to receive 24 VDC electrical signals from the control system, switch the flow direction of compressed air, and drive piston movement. The piston is connected to the lower valve body through a precision valve stem.
The valve body & seal module serves as the core of the entire assembly. The valve body is precisely machined from high-purity 316L stainless steel and electrochemically polished, featuring an ultra-smooth internal flow path that minimizes particle adhesion and process gas adsorption. The critical seat sealing area adopts semiconductor-grade corrosion-resistant FFKM perfluoroelastomer seals or high-standard metal-to-metal hard seal structures, maintaining an ultra-low leak rate (He < 1.0 × 10⁻⁹ mbar·L/s) even after millions of switching cycles.
Additionally, some versions of 003-102303-02-06 integrate magnetic or proximity position sensors at the valve stem to feed real-time open/close status back to the control system, enabling closed-loop position monitoring and stable system operation.
003-102303-02-06 is a high-precision integrated component that combines a pneumatic actuator and a high-purity shut-off valve body, embodying Lam Research’s professional expertise in ultra-clean gas control technology. The assembly consists of two core functional modules: a pneumatic actuator module and a valve body & seal module.
The pneumatic actuator module adopts a compact cylinder structure, equipped with a piston-spring configuration for single-acting versions or dual-piston design for double-acting versions. A high-response solenoid pilot valve is integrated on the top or side of the actuator to receive 24 VDC electrical signals from the control system, switch the flow direction of compressed air, and drive piston movement. The piston is connected to the lower valve body through a precision valve stem.
The valve body & seal module serves as the core of the entire assembly. The valve body is precisely machined from high-purity 316L stainless steel and electrochemically polished, featuring an ultra-smooth internal flow path that minimizes particle adhesion and process gas adsorption. The critical seat sealing area adopts semiconductor-grade corrosion-resistant FFKM perfluoroelastomer seals or high-standard metal-to-metal hard seal structures, maintaining an ultra-low leak rate (He < 1.0 × 10⁻⁹ mbar·L/s) even after millions of switching cycles.
Additionally, some versions of 003-102303-02-06 integrate magnetic or proximity position sensors at the valve stem to feed real-time open/close status back to the control system, enabling closed-loop position monitoring and stable system operation.
Key Features and Advantages
1. Superior Cleanliness and Corrosion Resistance
Specially engineered for harsh corrosive semiconductor process environments, all gas-contacting parts of 003-102303-02-06 are made of high-quality 316L stainless steel with ultra-precise electropolished inner surfaces and extremely low surface roughness (Ra). This design effectively mitigates valve body corrosion caused by reactive gases such as Cl₂ and BCl₃, fundamentally reducing particle generation and metal contamination risks. It plays a vital role in improving wafer yield and extending equipment maintenance intervals.
Specially engineered for harsh corrosive semiconductor process environments, all gas-contacting parts of 003-102303-02-06 are made of high-quality 316L stainless steel with ultra-precise electropolished inner surfaces and extremely low surface roughness (Ra). This design effectively mitigates valve body corrosion caused by reactive gases such as Cl₂ and BCl₃, fundamentally reducing particle generation and metal contamination risks. It plays a vital role in improving wafer yield and extending equipment maintenance intervals.
2. Extended Service Life and High Reliability
Equipped with high-performance FFKM seals and an optimized valve stem guiding structure, the component maintains stable performance after millions of switching operations. Its pneumatic actuator has passed rigorous durability tests, eliminating motion delay and stiction during continuous high-frequency process cycles. It significantly reduces unplanned downtime caused by valve failures, fully meeting the semiconductor industry’s strict requirements for long-service-life and high-reliability process equipment.
Equipped with high-performance FFKM seals and an optimized valve stem guiding structure, the component maintains stable performance after millions of switching operations. Its pneumatic actuator has passed rigorous durability tests, eliminating motion delay and stiction during continuous high-frequency process cycles. It significantly reduces unplanned downtime caused by valve failures, fully meeting the semiconductor industry’s strict requirements for long-service-life and high-reliability process equipment.
3. Fast Response and Precise Process Control
003-102303-02-06 integrates a high-flow, low-power-consumption solenoid pilot valve and an optimized cylinder gas path layout, delivering an ultra-fast switching response speed of less than 100 ms (typical). This capability ensures process gases enter the reaction chamber with precise timing accuracy, which is critical for complex processes requiring rapid gas switching (e.g., multi-layer film etching). It effectively improves process repeatability and product consistency for mass production.
003-102303-02-06 integrates a high-flow, low-power-consumption solenoid pilot valve and an optimized cylinder gas path layout, delivering an ultra-fast switching response speed of less than 100 ms (typical). This capability ensures process gases enter the reaction chamber with precise timing accuracy, which is critical for complex processes requiring rapid gas switching (e.g., multi-layer film etching). It effectively improves process repeatability and product consistency for mass production.
Application Fields
003-102303-02-06 is exclusively applied to plasma process equipment in semiconductor front-end manufacturing. It is widely installed on the Gas Panel of Lam Research 2300 Series etchers (including Kiyo dielectric etch and Flex conductor etch tools) and partial Versys Series deposition and cleaning tools.
As a key actuating component of the gas delivery system, it precisely controls the supply and cutoff of process gases, purge gases (e.g., N₂), and carrier gases (e.g., He) delivered to the reaction chamber. It covers all timing-dependent gas control processes, including staged gas switching, chamber pressure buildup, gas stabilization, chamber purging, and chamber evacuation.
For manufacturers of advanced logic chips, DRAM, and 3D NAND flash memory, the high reliability of 003-102303-02-06 guarantees accurate gas ratio execution, uniform etching and deposition effects, and supports strict process control and high-volume production yield stability.
003-102303-02-06 is exclusively applied to plasma process equipment in semiconductor front-end manufacturing. It is widely installed on the Gas Panel of Lam Research 2300 Series etchers (including Kiyo dielectric etch and Flex conductor etch tools) and partial Versys Series deposition and cleaning tools.
As a key actuating component of the gas delivery system, it precisely controls the supply and cutoff of process gases, purge gases (e.g., N₂), and carrier gases (e.g., He) delivered to the reaction chamber. It covers all timing-dependent gas control processes, including staged gas switching, chamber pressure buildup, gas stabilization, chamber purging, and chamber evacuation.
For manufacturers of advanced logic chips, DRAM, and 3D NAND flash memory, the high reliability of 003-102303-02-06 guarantees accurate gas ratio execution, uniform etching and deposition effects, and supports strict process control and high-volume production yield stability.
Related Products
- 003-102303-01-06: Same-series pneumatic isolation valve with alternative port dimensions or seal materials, adapted for different gas flow rates and corrosion-level working conditions.
- 003-102303-02-04: Variant model with different pneumatic supply pressure ranges or solenoid voltage specifications (24 VDC / 110 VAC).
- 778-900046-203: High-precision digital Mass Flow Controller (MFC), typically installed downstream of the valve for precise gas flow regulation.
- 778-905078-001: Lam Research integrated Gas Manifold, a high-level assembly integrating multiple gas components including 003-102303-02-06.
- 852-002374-102: Standard installation and maintenance kit for the pneumatic valve, including dedicated replacement seals, gaskets, and lubricants.
- 003-100560-001: Gas panel Pressure Regulator, generally installed upstream of the valve to stabilize supply gas pressure.
- 830-101250-008: Lam Research universal Flow Verifier, used for gas flow and response time system verification after valve replacement.
- 003-102303-01-06: Same-series pneumatic isolation valve with alternative port dimensions or seal materials, adapted for different gas flow rates and corrosion-level working conditions.
- 003-102303-02-04: Variant model with different pneumatic supply pressure ranges or solenoid voltage specifications (24 VDC / 110 VAC).
- 778-900046-203: High-precision digital Mass Flow Controller (MFC), typically installed downstream of the valve for precise gas flow regulation.
- 778-905078-001: Lam Research integrated Gas Manifold, a high-level assembly integrating multiple gas components including 003-102303-02-06.
- 852-002374-102: Standard installation and maintenance kit for the pneumatic valve, including dedicated replacement seals, gaskets, and lubricants.
- 003-100560-001: Gas panel Pressure Regulator, generally installed upstream of the valve to stabilize supply gas pressure.
- 830-101250-008: Lam Research universal Flow Verifier, used for gas flow and response time system verification after valve replacement.
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